Data for: Energetic particle irradiation study of TiN coatings

Published: 17 September 2018| Version 2 | DOI: 10.17632/54rygzkzkh.2
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Description

This dataset presents the experimental parameters to ensure the reproducibility of this research work: 1. The ion beam parameters of the MIAMI-2 facility for 134 keV Xe irradiation at 473 K. 2. The parameters of the magnetron sputtering deposition of the TiN thin films. 3. The spreadsheet for fluence-to-dpa conversion. 4. The analysis of Xe bubbles sizes at up to 6.2 dpa. 5. The high-resolution and processed TEM, STEM-EDX HAADF, EFTEM micrographs for future comparison and reference.

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Steps to reproduce

1. Produce nanocrystalline TiN thin films by magnetron sputtering as per indicated. 2. Make TEM lamellae from the produced material using the Focused Ion Beam technique. 3. Using any in situ TEM with ion irradiation facility, produce a 134 keV Xe+ ion beam with a flux of 1.59E13 ions/cm2/s. 4. Perform irradiations up to a fluence of 6.7E+15 ions/cm2 (6.2 dpa) whilst monitoring the microstructure with a TEM. 5. Do post-irradiation screening using standard EFTEM/STEM-EDX techniques.

Institutions

Oak Ridge National Laboratory, Universidade de Sao Paulo, Universidade do Estado de Santa Catarina, University of Huddersfield

Categories

Thin Film, Magnetron Sputtering, Transmission Electron Microscopy, Ion Irradiation

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