General information

URL

http://data.mendeley.com/datasets/ms5nxv5px3/1/files/1c6648a8-f76e-443a-bcf9-b4aa4f2eec9e/Figure%205.opj?dl=1

Reference this file

Cite this dataset

Xu, Hengyu (2018), “Data for: Influence on Curvature Induced Stress to the Flatband Voltage and Interface Density of 4H-SiC MOS Structure”, Mendeley Data, v1 http://dx.doi.org/10.17632/ms5nxv5px3.1#file-1c6648a8-f76e-443a-bcf9-b4aa4f2eec9e

opj Figure 5.opj