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                <identifier>oai:data.mendeley.com/fgfz3m2j6x.1</identifier>
                <datestamp>2026-10-02T10:38:51Z</datestamp>
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            <metadata><oai_dc:dc xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
    <dc:creator>li, gq</dc:creator>
    <dc:title>Dataset: Position-Specific UVO Treatment on Dual-Active-Layer IGTO TFTs</dc:title>
    <dc:publisher>Mendeley Data</dc:publisher>
    <dc:description>This dataset contains the electrical characterisation data of dual-active-layer amorphous IGTO thin-film transistors (TFTs) treated with ultraviolet–ozone (UVO) at two different positions within the channel stack. Two factors are varied: the treatment position (top layer or bottom layer) and the UVO duration (0, 10, 15, 20 and 25 min), where 0 min is the untreated reference. It comprises 10 device conditions and 1,010 transfer-curve datapoints, each measured by sweeping the gate voltage from −10 V to 40 V at a constant drain bias of 10 V (V_DS = 10 V), for devices with a channel W/L of 50/1 and a 100 nm SiO₂ gate dielectric. The data show that the effect of UVO treatment depends on which layer is treated: top-layer treatment mainly suppresses the off-state current, whereas bottom-layer treatment mainly improves carrier transport, raising saturation mobility, on-state current and the current on/off ratio. </dc:description>
    <dc:subject>Materials Science</dc:subject>
    <dc:type>Dataset</dc:type>
    <dc:identifier>doi:10.17632/fgfz3m2j6x.1</dc:identifier>
    <dc:identifier>oai:data.mendeley.com/fgfz3m2j6x.1</dc:identifier>
    <dc:rights>Creative Commons Attribution 4.0 International</dc:rights>
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    <dc:date>2026-10-02T10:38:51Z</dc:date>
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