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    <dc:creator>Sheikholeslam, Arash</dc:creator>
    <dc:title>Data for: Hydrogen dissociation and diffusion near the Si &lt; 111 &gt; /a-SiO2 interface: understanding degradation in MOSFETs</dc:title>
    <dc:publisher>Mendeley Data</dc:publisher>
    <dc:description>Initial xyz data of Si/SiO2 interface with hydrogen passivated dangling bonds.</dc:description>
    <dc:subject>Electrical Engineering</dc:subject>
    <dc:subject>Chemistry</dc:subject>
    <dc:subject>Materials Science</dc:subject>
    <dc:contributor>grecu, Cristian</dc:contributor>
    <dc:contributor>Ivanov, Andre</dc:contributor>
    <dc:contributor>Manzano, Hegoi</dc:contributor>
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