Data for: Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films

Published: 10 March 2019| Version 3 | DOI: 10.17632/3v9kj944d4.3
Matheus A. Tunes, Vladimir Vishnyakov


Data contains the processed and raw micrographs, the raw results from measurements and a pdf files with the routes for reproducing the synthesis and characterisation results obtained with the NbTaMoW refractory high-entropy alloy thin film research.


Steps to reproduce

1. Produce the film via IBSD as described in the materials and methods section; check composition with EDX. 2. Produce TEM electron-transparent lamellae using FIB. 3. Chracterisation of the thin films has to be performed in the TEM including EFTEM. 4. Perform nanomechanical measurements as indicate in the manuscript.


University of Huddersfield


Electron Microscopy, Thin Film, Nanomechanics