Data for: Effect of High Energy Shot Peening on the Wear Resistance of TiN Films on a TA2 Surface

Published: 14 September 2019| Version 1 | DOI: 10.17632/5ygnm3xtzk.1
Contributor:
Conghui Zhang

Description

The single magnetron sputtering technology has great limitations in the further optimization of the mechanical properties of TiN films. High energy shot peening (HESP), as a simple and efficient surface nanotechnology, has been widely used in the aerospace, mechanical processing and other fields. After being impacted by the projectile, the surface of the substrate will undergo severe deformation that induces nanocrystallization of the surface grains, thus greatly enhancing the surface activity. Combining HESP with high power impulse magnetron sputtering (HIPIMS)to understand how HESP affects the growth of TiN films on a TA2 surface and whether it can improve the wear resistance of TiN films has important research significance.

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Categories

Films, Tin, Magnetron Sputtering, Shot Peening

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