Thin films of titanium oxides (Ti-O), titanium oxynitrides (Ti-O-N), and copper doped titanium nitride (Ti-Cu-N) were deposited on the glass substrate. Ti-O and Ti-O-N films were deposited by cathodic arc plasma evaporation while TiN-Cu films were deposited by cathodic arc evaporation and unbalanced magnetron sputtering hybrid system. Ellipsometry is a technique that uses polarized light and the relative phase change in a beam of reflected polarized light. It's a very sensitive measurement and more accurate that intensity reflectance. The extinction coefficient of Ti-O sample shows zero value at 370 nm, while the extinction coefficient of Ti-O-N has almost zero value between 700 and 1150 nm, and between 150 and 2500 nm, typical for exceptionally good capacitors. Oppositely, the extinction coefficient of Ti-N-Cu shows in the wavelength range between 1500 and 2500 nm extremely high values reaching up to 18, being typical for materials with extremely high reflectance.