Ellipsometric data

Published: 9 May 2020| Version 1 | DOI: 10.17632/9vxkwwmmgc.1
Vukoman Jokanovic, Manuela Ferrara


Thin films of titanium oxides (Ti-O), titanium oxynitrides (Ti-O-N), and copper doped titanium nitride (Ti-Cu-N) were deposited on the glass substrate. Ti-O and Ti-O-N films were deposited by cathodic arc plasma evaporation while TiN-Cu films were deposited by cathodic arc evaporation and unbalanced magnetron sputtering hybrid system. Ellipsometry is a technique that uses polarized light and the relative phase change in a beam of reflected polarized light. It's a very sensitive measurement and more accurate that intensity reflectance. The extinction coefficient of Ti-O sample shows zero value at 370 nm, while the extinction coefficient of Ti-O-N has almost zero value between 700 and 1150 nm, and between 150 and 2500 nm, typical for exceptionally good capacitors. Oppositely, the extinction coefficient of Ti-N-Cu shows in the wavelength range between 1500 and 2500 nm extremely high values reaching up to 18, being typical for materials with extremely high reflectance.



Ellipsometric Study of Thin Film, Ellipsometry, Titanium Oxide