The effect of the deposit temperature of ZnO doped with Ni by HFCVD
Description
The raw (XRD) and data (PL) files required to reproduce the findings reported in "The effect of the deposit temperature of ZnO doped with Ni by HFCVD" . The effect of the deposit temperature of zinc oxide (ZnO) doped with nickel (Ni) by hot filament chemical vapor deposition (HFCVD) technique can be observed. All the samples were deposited for 1 min using a H2 flow of 50 sccm. The source-filament distance was 2 mm, constant in all the deposits. The variation of the filament-substrate distance produces a different substrate temperature (deposit temperature).
Files
Steps to reproduce
Plot the data, the source of the A0 sample was ZnO without NiO. The deposit temperatures of the ZnO:Ni samples (source of ZnO with NiO 1:1) were 500 °C, 400 °C, 350 °C, and 300 °C labeled as A1, A2, A3, and A4, respectively.