Data for XRD, SEM-EDX, FT-IR, and XPS analyses for waste foundry dust before and after batch sorption tests using As(III) and Cr(VI) aqueous solutions
Waste foundry dust (WFD), an industrial by-product can be used as a reactive material to treat wastewater. XRD, SEM-EDX, FT-IR, and XPS analyses were performed on WFD samples, obtained before and after the batch sorption tests using As(III) and Cr(VI) aqueous solutions under various conditions (i.e., initial pH and reaction time) for determining As(III) and Cr(VI) removal characteristics. XRD analysis was conducted to determine the change in the mineral phase of the samples after the batch sorption tests. Quartz (SiO2), microcline (KAlSi3O8), and magnetite (Fe3O4) were observed for all samples. For the FT-IR analysis, in all samples, peaks were observed at 585 (Fe-O), 773 (Si-O), 1010 (Si-O-Si), 1560 (C=C), 2115 (C=C), 2340-2372 (O=C=O), and 2650-2700 (C-H) cm-1. The peaks above 1560 cm-1 are related to organic matters in the WFD, and peaks below 1010 cm-1 are related to quartz, microcline, and magnetite. For the SEM-EDX analysis, the major elements detected in the WFD samples before and after the batch sorption tests were Si, Al, and Fe. In addition, a small amount of As and Cr were detected in A-and B-series samples, respectively. For the XPS analysis, 1s peaks for C-C, C-O, and C=O were observed at a binding energy of 284.8, 286.0, and 287.0 eV. Only SiO2 peak for Si 2p was observed at 103.8 eV. Oxygen in all samples was mainly present in the form of SiO2, Fe-O, and M-OH.
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XRD analysis was conducted with an X-ray diffractometer (XRD, X’Pert MPD, Philips) using a Cu kα target (1.5412 Å) at 40 kV and 30 mA and the XRD spectra were obtained in the range of 3 – 65° 2θ at a scan speed of 2°/min with a step size of 0.01°. SEM-EDX analysis was conducted with a field-emission scanning electron microscopy (FE-SEM, Quanta 250FEG, FEI) and energy-dispersive X-ray spectroscopy (EDX). FT-IR analysis was conducted with Fourier-transform infrared spectroscopy (FT-IR, Cary 630 FT-IR, Agilent) in the range of 400 – 4000 cm-1 in ATR mode. XPS analysis was conducted with an X-ray photoelectron spectroscopy (XPS, PHI 5000 VersaProbe, ULVAC PHI) with monochromated Al kα (1486.6 eV) and anode (25 W at 15 kV) at a base pressure of 2.0 X 10-7 Pa and using dual neutralizer (Ar ion and electrons).