Data for: Fine-Tuning of Oxygen Vacancy and Interstitial Concentrations by Electrical Bias

Published: 16 Mar 2018 | Version 1 | DOI: 10.17632/jjwhr97b86.1
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Description of this data

Area-specific-resistance and chemical capacitance of donor doped layered cuprate thin film over a wide range of effective oxygen partial pressure.
In-plane conductivity of donor doped layered cuprate thin film over a wide range of effective oxygen partial pressure.

Experiment data files

This data is associated with the following publication:

Fine-tuning of oxygen vacancy and interstitial concentrations in La1.85Ce0.15CuO4+δ by electrical bias

Published in: Solid State Ionics

Latest version

  • Version 1

    2018-03-16

    Published: 2018-03-16

    DOI: 10.17632/jjwhr97b86.1

    Cite this dataset

    Tuller, Harry; Kim, Chang Sub (2018), “Data for: Fine-Tuning of Oxygen Vacancy and Interstitial Concentrations by Electrical Bias”, Mendeley Data, v1 http://dx.doi.org/10.17632/jjwhr97b86.1

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Categories

Resistance (Fungal Pathogenesis), Electrochemical Capacitance, Conductivity

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The files associated with this dataset are licensed under a Creative Commons Attribution 4.0 International licence.

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This dataset is licensed under a Creative Commons Attribution 4.0 International licence. What does this mean? You can share, copy and modify this dataset so long as you give appropriate credit, provide a link to the CC BY license, and indicate if changes were made, but you may not do so in a way that suggests the rights holder has endorsed you or your use of the dataset. Note that further permission may be required for any content within the dataset that is identified as belonging to a third party.

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