Data for: Influence of PECVD Deposition Temperature on Phosphorus Doped Poly-Silicon Passivating Contacts

Published: 31-03-2020| Version 1 | DOI: 10.17632/mty53w56jz.1
Contributor:
Wenhao Chen

Description

Performance characterization of passivating contacts including Raman, micro-PL, FTIR, XRD

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