Data for: Characteristics of TiO2 Thin Films Surfaces Treated by O2 Plasma in Dielectric Barrier Discharge with the Assistance of External Heating

Published: 30 August 2018| Version 1 | DOI: 10.17632/nmfkyzj2jd.1
Contributors:
Retsuo Kawakami,
Yoshitaka Nakano,
Chisato Azuma,
Masahito Niibe,
Yuma Araki,
Yuki Yoshitani,
Takashi Mukai

Description

Fig. 2. MB dye photodecomposition, ln(C/C0), of (a) TiO2 thin films treated with the heat-assisted plasma and the plasma only, and (b) TiO2 thin films annealed at a variety of gas pressures, as a function of UV irradiation time. Fig. 3. XRD patterns of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. Fig. 4. Optical absorption coefficients of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. Energy spectrum of photons emitted from a blacklight lamp used is also drawn in the same figure. Fig. 5. (a) O/Ti ratios for oxygen species adsorbed onto the surfaces of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. (b) O/Ti ratios for the O–Ti bond of the plasma-treated surfaces. Fig. 6. XRD patterns of TiO2 thin films annealed at a variety of gas pressures. Fig. 7. O/Ti ratios for oxygen species adsorbed onto the surface of TiO2 thin films annealed at a variety of gas pressures. Fig. 8. Comparison between MB dye photodecomposition rates, MB dye adsorption rates, and net MB dye photodecomposition rates of TiO2 thin film treated with the heat-assisted plasma and TiO2 nanoparticle powder, ST-01.

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