A program to solve a solute diffusion problem with segregation at a moving interface

Published: 01-01-1981| Version 1 | DOI: 10.17632/zgwx7nhp68.1
Contributors:
M. Bakker,
D. Hoonhout

Description

Title of program: DIFSEG Catalogue Id: ABVZ_v1_0 Nature of problem The diffusion and segregation of impurities implanted in silicon which accompany the annealing of implantation damage by means of pulsed-laser irradiation. Versions of this program held in the CPC repository in Mendeley Data ABVZ_v1_0; DIFSEG; 10.1016/0010-4655(81)90141-7 This program has been imported from the CPC Program Library held at Queen's University Belfast (1969-2018)

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