Mobile origin-licensing factors confer resistance to conflicts with RNA polymerase. Scherr et al (Part 3)

Published: 22 March 2022| Version 1 | DOI: 10.17632/btyb592ykb.1
Contributors:
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Description

Mobile origin-licensing factors confer resistance to conflicts with RNA polymerase Part 3. Raw microscopy data contained in separate zip files. Each file contains tif images collected with MicroManager 1.4. Photobleaching_licensed-DNA_ATP Photobleaching_low-chromatin-DNA

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Institutions

Max-Planck-Institut fur Biochemie, Technische Universitat Munchen

Categories

DNA Replication, Single Molecule Imaging

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