Data for: Experimental investigation of inductively coupled plasma etching on cemented carbides

Published: 25 Jan 2019 | Version 1 | DOI: 10.17632/h9g6dzcspp.1

This dataset is under embargo and will be publicly available (98 days) on 30 November 2019 at 12:00am UTC

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What does under embargo mean?

This data is associated with the following publication:

Experimental investigation of inductively coupled plasma etching on cemented carbides

Published in: Vacuum

Latest version

  • Version 1

    Under embargo

    Embargo Date: 2019-11-30 (98 days)

    Published: 2019-01-25

    DOI: 10.17632/h9g6dzcspp.1

    Cite this dataset

    Lian, Yunsong; Yao, Bin; Xie, Chaoping; Mu, Chenliang (2019), “Data for: Experimental investigation of inductively coupled plasma etching on cemented carbides”, Mendeley Data, v1 http://dx.doi.org/10.17632/h9g6dzcspp.1

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Categories

Cutting Tool, Surface Etching, Surface Texture, Cemented Carbide

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CC BY 4.0 Learn more

The files associated with this dataset are licensed under a Creative Commons Attribution 4.0 International licence.

What does this mean?

This dataset is licensed under a Creative Commons Attribution 4.0 International licence. What does this mean? You can share, copy and modify this dataset so long as you give appropriate credit, provide a link to the CC BY license, and indicate if changes were made, but you may not do so in a way that suggests the rights holder has endorsed you or your use of the dataset. Note that further permission may be required for any content within the dataset that is identified as belonging to a third party.

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