Mobile origin-licensing factors confer resistance to conflicts with RNA polymerase. Scherr et al (Part 4)

Published: 22 March 2022| Version 1 | DOI: 10.17632/mjgrth9b27.1
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Description

Mobile origin-licensing factors confer resistance to conflicts with RNA polymerase Part 4. Raw microscopy data contained in separate zip files. Each file contains tif images collected with MicroManager 1.4. Photobleaching_licensed-DNA_ATPgS Photobleaching_stalled_RNAP RNAP-ORC-collision_MCM_load

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Institutions

Max-Planck-Institut fur Biochemie, Technische Universitat Munchen

Categories

DNA Replication, Single Molecule Imaging

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